Technical Advantages
Full Production Process Under Independent Self-Control
Materials
Independent Development of Holographic Photoresist Materials
Ultra-low shrinkage ratio, high resolution, multi-wavelength photosensitivity, high transmittance, excellent film uniformity, high working efficiency, low absorptivity
System Integration
Self-developed Dual-axis Expanded Exit Pupil
Designed with Wade Optical Software
Surface Integrated Manufacturing Platform for Multi-grating Waveguides
Processes
Mature Interference Light Field Modulation & Manufacturing Processes
Holographic exposure manufacturing is widely recognized as a low-cost micro-nano fabrication technology. Boasting high process efficiency, holographic exposure is well-positioned for mass adoption in consumer electronics.
Designs
Self-developed Subwavelength, Non-sequential Vector System Design Software for Subwavelength Grating Simulation & System-level Diffractive Waveguide Design
Simulation, Performance Evaluation, Parameter Optimization
Scale Advantages
7,600 ㎡ Integrated Space for R&D, Production & Administration
Scale Advantage 1
20 Sets of High-standard Mass-production Medium-area Holographic Diffractive Optical Element Manufacturing Systems
Scale Advantage 2
1 Set of China’s Largest Manufacturing System for Holographic Diffractive Optical Elements (Holographic Interference Light Field Information Recording System)
Scale Advantage 3
One Coating Line Each for Silver Halide & Photopolymer Holographic Light Field Recording Materials
Nanchang Tripole Optoelectronics Co., Ltd.
Address:No. 909 Huangxi North Avenue,Xinjian District，Nanchang City,Jiangxi Province 330199，China